Mirror, lithographic apparatus and device manufacturing method

摘要

Embodiments of the invention relate to a mirror (30). The mirror includes a mirroring surface and a profiled coating layer (32a) having an outer surface, wherein one or more wedged elements are formed by the outer surface with respect to the mirroring surface, and wherein the one or more wedged elements having a wedge angle (ø) in a range of approximately 10-200 mrad. The profiled coating layer may have a curved outer surface. The profiled coating layer may be formed from at least one of the following materials: Be, B, C, P, K, Ca, Sc, Br, Rb, Sr, Y, Zr, Ru, Nb, Mo, Ba, La, Ce, Pr, Pa and U.

主权项

1. A mirror having a mirroring surface comprising:
a single profiled coating layer having an outer surface provided with two wedged elements formed with respect to the mirroring surface, wherein the two wedged elements have a wedge angle in a range of about 10-200 mrad and the two wedged elements are located next to each other and are symmetric with respect to a symmetry axis between them, and wherein extreme ultraviolet (EUV) radiation of a radiation beam is transmitted through the profiled coating layer, while other wavelengths of the radiation beam are reflected at the outer surface of the two wedged elements.