| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high-purity ionic vinyl monomer that has good compatibility with a resin and an organic solvent and does not contain a metal ion, an organic solvent and water; and an antistatic agent and an antistatic resin composition comprising the monomer. <P>SOLUTION: The ionic vinyl monomer is synthesized with high purity and a high yield, which is represented by general formula (1), wherein R<SB POS="POST">1</SB>represents a hydrogen atom or a methyl group; R<SB POS="POST">2</SB>and R<SB POS="POST">3</SB>each independently represents a 1-3C alkyl group, and may be the same or different from each other; R<SB POS="POST">4</SB>represents a 1-3C alkyl group, a 1-3C alkenyl group, or a benzyl group; Y represents an oxygen atom or NH-; Z represents a 1-3C alkylene group; and Rf<SP POS="POST">1</SP>and Rf<SP POS="POST">2</SP>may be the same or different from each other and each represents a 1-4C perfluoroalkyl group or a fluoro group with the carbon number of 0. A polymer and the like comprising the ionic vinyl monomer are used as antistatic active ingredients. <P>COPYRIGHT: (C)2013,JPO&INPIT |
