| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new composition for forming a photosensitive resist underlay film. <P>SOLUTION: The composition for forming a photosensitive resist underlay film contains: a polymer that has an aromatic ring optionally having a hydroxyl group or a carboxyl group as a substituent or has a heterocycle having at least one nitrogen atom; a crosslinking compound; a photoacid generator; a photo-radical polymerization initiator; and an organic solvent. The content of the photoacid generator is effectively 0.5 to 25 mass% with respect to the content of the polymer; and the content of the photo-radical polymerization initiator is effectively 0.3 to 45 mass% with respect to the content of the polymer. <P>COPYRIGHT: (C)2013,JPO&INPIT |
