| 摘要 |
PROBLEM TO BE SOLVED: To provide a hole pattern having an ultrafine pore diameter, excellent in circularity while maintaining excellent dependence on development time.SOLUTION: There is provided an actinic ray sensitive or radiation sensitive resin composition including: (P) a resin having a repeating unit (a) represented by the following general formula (I); (B) a compound that generates an organic acid by irradiation with an actinic ray or radiation; and (C) a basic compound or an ammonium salt compound that decreases basicity by irradiation with the actinic ray or radiation. A molar ratio [C]/[B] of the compound (C) to the compound (B) is 0.4 or more. A resist film, a pattern forming method, a method for manufacturing an electronic device and an electronic device using the same are also provided. In the general formula (I), Rrepresents a hydrogen atom or a methyl group. R, Rand Reach independently represent a linear or branched alkyl group. |
