| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing method and device capable of performing supercritical dry processing without generating faults, such as pattern collapse.SOLUTION: According to the substrate processing method, ultrapure water is supplied on a surface of a substrate. On the surface of the substrate on which the ultrapure water is adhered, a solvent containing alcoholic fluoride is supplied. On the surface of the substrate on which the solvent containing alcoholic fluoride is adhered, a first solvent having dissolubility to the solvent containing alcoholic fluoride and different from the solvent containing alcoholic fluoride is supplied. The substrate on which the first solvent is adhered is introduced into a chamber, and the first solvent on the surface of the substrate is replaced with supercritical fluid, and then a pressure in the chamber is reduced to change the supercritical fluid into the gas. The substrate is ejected from the chamber. |
