发明名称 Reticle transfer system and method
摘要 A fabrication system comprises a global system comprising a plurality of stockers and a global transportation system connected to the stockers, a local system coupled to the global system through the global transportation system, wherein the local system comprises a first buffer located at a boundary between the global system and the local system, a plurality of lithography apparatuses coupled to the first buffer through a local transportation system and an empty pod buffer.
申请公布号 US9287150(B2) 申请公布日期 2016.03.15
申请号 US201213648034 申请日期 2012.10.09
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Chang Ching-Jung
分类号 G03B27/42;H01L21/677;H01L21/67 主分类号 G03B27/42
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A fabrication system comprising: a global system comprising a plurality of stockers and a global transportation system connected to the stockers; a local system coupled to the global system through the global transportation system, wherein the local system comprises: a first buffer located at a boundary between the global system and the local system;a plurality of lithography apparatuses coupled to the first buffer through a local transportation system;an aisle, wherein a first terminal of the aisle is connected to the first buffer;a first rail coupled between the first buffer and a first group of lithography apparatuses;a second rail coupled between the first buffer and a second group of lithography apparatuses, wherein the first group of lithography apparatuses and the second group of lithography apparatuses are on opposite sides of the aisle;a second buffer connected to a second terminal of the aisle;an internal buffer located between the first buffer and the second buffer, wherein the internal buffer is adjustable; andan empty pod buffer.
地址 Hsin-Chu TW