APPARATUS FOR PROTECTING EXTREME ULTRA VIOLET(EUV) MASK, AND EUV EXPOSURE APPARATUS COMPRISING THE SAME

摘要

The present invention provides an extreme ultraviolet (EUV) mask protection device, which can effectively protect an EUV mask from contaminants such as particles during an EUV exposure process, and an exposure apparatus including the same. The EUV mask protection device includes: an EUV pellicle which transmits EUV to irradiate the EUV mask with EUV and has the size corresponding to the size of a slit which limits the EUV within a portion of the EUV mask; flexible blocking films formed on both sides of the EUV pellicle in a first direction, which is a scan direction of the exposure apparatus; and a roller unit having a first roller to allow the blocking film on one side of the EUV pellicle to be wound therearound and a second roller to allow the blocking film on the other side to be wound therearound.