METAL SUBSTRATE AND MASK USING THE SAME

摘要

The present invention relates to a metal substrate and a deposition mask using the same with maximized deposition efficiency. The purpose of the present invention is to provide a deposition mask and a metal layer with a torsional index (Hr) to minimize twisting caused when the metal substrate etching is conducted to make a deposition mask. According to the present invention, the metal substrate comprises a base metal panel having a thickness. The base metal panel includes first and second surfaces facing each other, configured to provide an etching area.