LINER FOR EPI CHAMBER

摘要

Embodiments disclosed herein describe a liner assembly including a plurality of individually separated gas passages. The liner assembly provides control of flow parameters, such as velocity, density, direction and spatial location, across a substrate being processed. The processing gas across the substrate being processed may be specially tailored for individual processes with a liner assembly according to the present embodiments.

主权项

1. A liner assembly, comprising:
a cylindrical body having:
an outer surface and an inner surface, the outer surface having an outer circumference less than a circumference of the semiconductor process chamber, the inner surface forming the walls of a process volume;a plurality of gas passages formed in connection with the cylindrical body;an exhaust port positioned opposite to the plurality of gas passages;a crossflow port positioned non parallel to the exhaust port; anda thermal sensing port positioned separate from the crossflow port.