发明名称 ELECTRON BEAM DEVICE AND GAS SUPPLY DEVICE FOR ELECTRON BEAM DEVICE
摘要 The objective of the present invention is to provide a device by which a gas handling operation can be carried out in an in situ observation of a sample inside an electron microscope, more safely and more efficiently than in prior art. The device comprises: a scope body having a sample holder (6) for holding a sample (13), a sample chamber (12) in vacuum for housing the sample holder (6) whereby the sample (13) is held, an electron source (2) for irradiating an electron beam onto the sample (13) being held, and a detector for detecting a signal obtained from the sample by the irradiation of the electron beam; and a gas supply unit for introducing gas into the scope body . The gas supply unit comprises a gas container housing portion (11a) that houses small-size gas containers (16 (a, b, c)), and a gas introduction nozzle (14) wherethrough the gas inside each of the gas containers that are housed in the gas container housing portion (11a) is introduced into a region containing at least the sample held inside the sample chamber in vacuum. The gas container housing portion (11a) is disposed outside the scope body and in the vicinity of the location where the sample is being held.
申请公布号 WO2016035493(A1) 申请公布日期 2016.03.10
申请号 WO2015JP71900 申请日期 2015.08.03
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 YAGUCHI TOSHIE;NAGAKUBO YASUHIRA
分类号 H01J37/20;H01J37/26 主分类号 H01J37/20
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