发明名称 THREE-DIMENSIONAL STRUCTURED MEMORY DEVICES
摘要 A 3D structured nonvolatile semiconductor memory devices and methods for manufacturing are disclosed. One such device includes an n+ region at a source/drain region; a p+ region at the source/drain region; and a diffusion barrier material between the n+ region and the p+ region. The n+ region is substantially isolated from the p+ region.
申请公布号 US2016071880(A1) 申请公布日期 2016.03.10
申请号 US201514942533 申请日期 2015.11.16
申请人 Micron Technology, Inc. 发明人 Lee Ki Hong;Pyi Seung Ho;Kwon Il Young;Bin Jin Ho
分类号 H01L27/115;H01L21/02;H01L21/265;H01L29/08 主分类号 H01L27/115
代理机构 代理人
主权项 1. A three-dimensional structured memory device, comprising: a source/drain region; a n+ region formed at the source/drain region; a p+ region formed at the source/drain region; and a diffusion barrier material formed between the n+ region and the p+ region, the n+ region being substantially isolated from the p+ region.
地址 Boise ID US