发明名称 |
THREE-DIMENSIONAL STRUCTURED MEMORY DEVICES |
摘要 |
A 3D structured nonvolatile semiconductor memory devices and methods for manufacturing are disclosed. One such device includes an n+ region at a source/drain region; a p+ region at the source/drain region; and a diffusion barrier material between the n+ region and the p+ region. The n+ region is substantially isolated from the p+ region. |
申请公布号 |
US2016071880(A1) |
申请公布日期 |
2016.03.10 |
申请号 |
US201514942533 |
申请日期 |
2015.11.16 |
申请人 |
Micron Technology, Inc. |
发明人 |
Lee Ki Hong;Pyi Seung Ho;Kwon Il Young;Bin Jin Ho |
分类号 |
H01L27/115;H01L21/02;H01L21/265;H01L29/08 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
1. A three-dimensional structured memory device, comprising:
a source/drain region; a n+ region formed at the source/drain region; a p+ region formed at the source/drain region; and a diffusion barrier material formed between the n+ region and the p+ region, the n+ region being substantially isolated from the p+ region. |
地址 |
Boise ID US |