发明名称 SHIELD MEMBER AND APPARATUS FOR GROWING SINGLE CRYSTAL EQUIPPED WITH THE SAME
摘要 A shield member and an apparatus for growing a single crystal equipped with the shield member. Such a shield member includes: a vessel for growing the single crystal; a raw material storage part positioned at a lower portion of the vessel for growing the single crystal; a substrate supporting part, positioned above the raw material storage part to support the substrate; and a heating apparatus positioned at an outer periphery of the vessel for growing the single crystal, thereby sublimating the raw material from the raw material storage part to grow the single crystal of the raw material onto the substrate, in which a plurality of permeation holes through which the raw material gas passes is formed. The shield member is configured such that the heat capacity thereof increases from the center to the outer periphery.
申请公布号 US2016068995(A1) 申请公布日期 2016.03.10
申请号 US201514944282 申请日期 2015.11.18
申请人 SHOWA DENKO K.K. 发明人 MATSUSE Akihiro
分类号 C30B23/06;C30B29/36 主分类号 C30B23/06
代理机构 代理人
主权项 1. A shield member which is placed between a raw material storage part and a substrate supporting part in an apparatus for growing a single crystal and is placed apart from a raw material held in the raw material storage part, the apparatus comprising: a vessel for growing the single crystal; a raw material storage part positioned at a lower portion of the vessel for growing a crystal; a substrate supporting part, positioned above the raw material storage part so as to be opposed to the raw material storage part to support the substrate; and a heating apparatus positioned at an outer periphery of the vessel for growing the single crystal, thereby sublimating the raw material from the raw material storage part to grow the single crystal of the raw material onto the substrate, wherein the shield member consists of a single member, a plurality of permeation holes through which the raw material gas passes is formed, and the shield member is configured such that the thickness of the shield member increases from the center to the outer periphery and the shield member has the heat capacity which increases from the center to the outer periphery due to the configuration.
地址 Tokyo JP