| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid immersion exposure apparatus having two substrate stages which prevents entanglement of cables connected to the individual substrate stages and reduces the length of the cables.SOLUTION: In a liquid immersion exposure apparatus, a controller controls drive of wafer stages WST1 and WST2 to move relatively so that one of the stages WST1 and WST2 approaches the other, and a liquid immersion region 14 moves from one stage to the other while being kept in a projection optical system through movement of both the stages approaching a nozzle unit. The stage WST1 is connected with a cable from he -X side, and the stage WST2 is connected with a cable from the +X side. The controller drives both the stages WST1 and WST2 from an exposure station to a measurement station provided with an alignment system through mutually different feedback paths.SELECTED DRAWING: Figure 57 |
