ATMOSPHERIC EPITAXIAL DEPOSITION CHAMBER

摘要

Embodiments described herein disclose epitaxial deposition chambers and components thereof. In one embodiment, a chamber can include a substrate support positioned in a processing region, a radiant energy assembly comprising a plurality of radiant energy sources, a liner assembly having an upper liner and a lower liner, and a dome assembly positioned between the substrate support and the radiant energy assembly. The epitaxial deposition chambers described herein allow for processing of larger substrates, while maintaining throughput, reducing costs and providing a reliably uniform deposition product.