EXPOSURE METHOD AND EXPOSURE APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an exposure method and an exposure apparatus, by which deviation of an exposure pattern caused by the accuracy of an apparatus itself can be relatively easily decreased.SOLUTION: The exposure method includes: a step of scanning an exposure object substrate 200 with laser light so as to project an ideal exposure pattern P1 by exposure; a step of detecting deviation of a real exposure pattern P2 formed on the exposure object substrate 200 from the ideal exposure pattern P1; a step of adjusting an exit timing of the laser light so as to decrease the deviation; and a step of scanning another exposure object substrate 200 with the laser light at the adjusted exit timing to expose the substrate.SELECTED DRAWING: Figure 7