发明名称 METALLIC GRATINGS AND MEASUREMENT METHODS THEREOF
摘要 There is set forth herein in one embodiment, a structure including a metallic grating having a grating pattern, the metallic grating including a critical dimension. The metallic grating can output a spectral profile when exposed to electromagnetic radiation, the spectral profile having a feature. The grating pattern can be configured so that a change of the critical dimension produces a shift in a value of the feature of the spectral profile. A method can include propagating input electromagnetic radiation onto a metallic grating having a two dimensional periodic grating pattern and measuring a critical dimension of the metallic grating using output electromagnetic radiation from the metallic grating.
申请公布号 US2016069792(A1) 申请公布日期 2016.03.10
申请号 US201514847624 申请日期 2015.09.08
申请人 THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK 发明人 O'Mullane Sam;Diebold Alain C.;Peterson Brennan;Keller Nicholas
分类号 G01N21/21;G01N21/95;G01B11/02 主分类号 G01N21/21
代理机构 代理人
主权项 1. A structure comprising: a metallic grating having a grating pattern, the metallic grating including a critical dimension; wherein the metallic grating outputs a spectral profile when exposed to electromagnetic radiation, the spectral profile having a feature; wherein the grating pattern is configured so that a change of the critical dimension produces a shift in a value of the feature of the spectral profile.
地址 Albany NY US