发明名称 |
METALLIC GRATINGS AND MEASUREMENT METHODS THEREOF |
摘要 |
There is set forth herein in one embodiment, a structure including a metallic grating having a grating pattern, the metallic grating including a critical dimension. The metallic grating can output a spectral profile when exposed to electromagnetic radiation, the spectral profile having a feature. The grating pattern can be configured so that a change of the critical dimension produces a shift in a value of the feature of the spectral profile. A method can include propagating input electromagnetic radiation onto a metallic grating having a two dimensional periodic grating pattern and measuring a critical dimension of the metallic grating using output electromagnetic radiation from the metallic grating. |
申请公布号 |
US2016069792(A1) |
申请公布日期 |
2016.03.10 |
申请号 |
US201514847624 |
申请日期 |
2015.09.08 |
申请人 |
THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK |
发明人 |
O'Mullane Sam;Diebold Alain C.;Peterson Brennan;Keller Nicholas |
分类号 |
G01N21/21;G01N21/95;G01B11/02 |
主分类号 |
G01N21/21 |
代理机构 |
|
代理人 |
|
主权项 |
1. A structure comprising:
a metallic grating having a grating pattern, the metallic grating including a critical dimension; wherein the metallic grating outputs a spectral profile when exposed to electromagnetic radiation, the spectral profile having a feature; wherein the grating pattern is configured so that a change of the critical dimension produces a shift in a value of the feature of the spectral profile. |
地址 |
Albany NY US |