| 发明名称 |
METAL PATTERN ON ELECTROMAGNETIC ABSORBER STRUCTURE |
| 摘要 |
A metal pattern formed in the electromagnetic absorber structure is provided. By performing the laser treatment to form the active layer thereon, the metal pattern can be regionally formed on the electromagnetic absorber structure in the following electroless plating processes. |
| 申请公布号 |
US2016072192(A1) |
申请公布日期 |
2016.03.10 |
| 申请号 |
US201514816048 |
申请日期 |
2015.08.02 |
| 申请人 |
Wistron NeWeb Corp. |
发明人 |
Radi Babak;Hsu Yuan-Chin;Kuo Yu-Fu;Wu Tzu-Min;Chuang Tzu-Wen;Chen Shih-Hong |
| 分类号 |
H01Q17/00 |
主分类号 |
H01Q17/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An electromagnetic absorber structure having a metal pattern, the electromagnetic absorber structure comprising:
an electromagnetic absorber layer disposed in the electromagnetic absorber structure; at least an insulative layer covering the surface of the electromagnetic absorber layer, wherein the electromagnetic absorber structure has at least a predetermined region, and the surface of the electromagnetic absorber layer overlapping with the predetermined region is not covered by the insulative covering layer; and a metal pattern located within the predetermined region and on the surface of the electromagnetic absorber layer of the electromagnetic absorber structure. |
| 地址 |
Hsinchu TW |
