| 发明名称 |
PHOTOSENSITIVE FILM, METHOD FOR FORMING METAL PATTERN, AND PATTERN SUBSTRATE |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive film that gives a metal pattern by plating without depending on types of substrates.SOLUTION: A photosensitive film 10 comprises a support film 1, a plate seed layer 2 disposed on the support film 1, and a photosensitive resin layer 3 disposed on the plate seed layer 2.SELECTED DRAWING: Figure 1 |
| 申请公布号 |
JP2016033640(A) |
申请公布日期 |
2016.03.10 |
| 申请号 |
JP20140243254 |
申请日期 |
2014.12.01 |
| 申请人 |
HITACHI CHEMICAL CO LTD |
发明人 |
HIRAO KOHEI;EBIHARA MASAHIKO;EJIRI YOSHINORI;MURAKAMI TAIJI |
| 分类号 |
G03F7/004;G03F7/031;G03F7/11;G03F7/40;H05K3/18 |
主分类号 |
G03F7/004 |
| 代理机构 |
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