发明名称 |
SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF |
摘要 |
According to one embodiment, a semiconductor memory device includes a lower electrode, an MTJ element, a cap layer and an upper electrode. The lower electrode is provided above a semiconductor substrate. The MTJ element is provided above the lower electrode. The cap layer is provided above the MTJ element and is oxygen-free. The upper electrode is connected to the cap layer. |
申请公布号 |
US2016072047(A1) |
申请公布日期 |
2016.03.10 |
申请号 |
US201514629087 |
申请日期 |
2015.02.23 |
申请人 |
SETO Satoshi;YOSHIKAWA Masatoshi;TSUBATA Shuichi;TOMIOKA Kazuhiro |
发明人 |
SETO Satoshi;YOSHIKAWA Masatoshi;TSUBATA Shuichi;TOMIOKA Kazuhiro |
分类号 |
H01L43/08;H01L43/12;H01L43/02 |
主分类号 |
H01L43/08 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor memory device comprising:
a lower electrode above a semiconductor substrate; a magnetic tunnel junction (MTJ) element above the lower electrode; an oxygen-free cap layer above the MTJ element; and an upper electrode connected to the cap layer. |
地址 |
Seoul KR |