发明名称 SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
摘要 According to one embodiment, a semiconductor memory device includes a lower electrode, an MTJ element, a cap layer and an upper electrode. The lower electrode is provided above a semiconductor substrate. The MTJ element is provided above the lower electrode. The cap layer is provided above the MTJ element and is oxygen-free. The upper electrode is connected to the cap layer.
申请公布号 US2016072047(A1) 申请公布日期 2016.03.10
申请号 US201514629087 申请日期 2015.02.23
申请人 SETO Satoshi;YOSHIKAWA Masatoshi;TSUBATA Shuichi;TOMIOKA Kazuhiro 发明人 SETO Satoshi;YOSHIKAWA Masatoshi;TSUBATA Shuichi;TOMIOKA Kazuhiro
分类号 H01L43/08;H01L43/12;H01L43/02 主分类号 H01L43/08
代理机构 代理人
主权项 1. A semiconductor memory device comprising: a lower electrode above a semiconductor substrate; a magnetic tunnel junction (MTJ) element above the lower electrode; an oxygen-free cap layer above the MTJ element; and an upper electrode connected to the cap layer.
地址 Seoul KR