CHARGED PARTICLE BEAM WRITING APPARATUS, METHOD OF ADJUSTING BEAM INCIDENT ANGLE TO TARGET OBJECT SURFACE, AND CHARGED PARTICLE BEAM WRITING METHOD

摘要

A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.

主权项

1. A charged particle beam writing apparatus comprising:
an emission unit configured to emit a charged particle beam; an electron lens configured to converge the charged particle beam; a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, configured to deflect the charged particle beam in a case of performing a blanking control of switching between beam-on and beam-off; a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, configured to block the charged particle beam having been deflected to be in a beam-off state; and a plurality of magnet coils, arranged backward of the blanking deflector with respect to the direction of the optical axis, configured to deflect the charged particle beam, wherein a magnetic field formed by the plurality of magnet coils is adjusted so that an intersection of the optical axis and an extended line of a trajectory of the charged particle beam deflected by the plurality of magnet coils is located in a center height position of the blanking deflector.