| 摘要 |
An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation. |
| 主权项 |
1. An extreme ultraviolet light source device comprising:
a disc-like rotating element; a rotation unit configured to cause the rotating element to rotate about a rotation center shaft, which is perpendicular to a flat portion of the rotating element; a cover-like structure configured to surround the rotating element with a gap; a first reserving vessel disposed in the cover-like structure and configured to reserve a liquid high temperature plasma raw material, with part of the rotating element being immersed in the high temperature plasma raw material reserved in the first reserving vessel; a raw material supplying mechanism configured to apply the liquid high temperature plasma raw material onto at least part of a surface of the rotating element upon a rotating movement of the rotating element; an energy beam providing device configured to irradiate the high temperature plasma raw material with an energy beam; and a film thickness controlling mechanism provided in the cover-like structure, the film thickness controlling mechanism including a structure having a channel-like recess, the structure being biased by an elastic body in a direction against the surface of the rotating element such that the structure contacts the surface of the rotating element, a clearance between the rotating element and a bottom of the recess of the structure, which faces the rotating element, being set such that the liquid high temperature plasma raw material applied on the rotating element has a predetermined film thickness, the cover-like structure of the raw material supplying mechanism having an opening in a certain part of the cover-like structure such that the energy beam is directed to that surface of the rotating element, on which the high temperature plasma raw material is applied, through the opening of the cover-like structure, and extreme ultraviolet light generated upon irradiation of the energy beam is released from the opening of the cover-like structure, the cover-like structure having a scattering preventing member disposed to oppose a direction of a centrifugal force acting on the rotating element, which is caused to rotate by the rotation unit, and cover the rotating element. |
