发明名称 |
LINKAGE CONDUIT FOR VACUUM CHAMBER APPLICATIONS |
摘要 |
An ion implantation apparatus including an enclosure defining a process chamber, a carriage slidably mounted on a shaft within the process chamber and coupled to a drive mechanism adapted to selectively move the carriage along the shaft. A platen assembly can be coupled to the carriage, and a linkage conduit can extend between a side wall of the enclosure and the carriage. The linkage conduit can include a plurality of pivotably interconnected linkage members that define a contiguous internal volume that is sealed from the process chamber. The contiguous volume can be held at a desired vacuum pressure separate from the vacuum environment of the process chamber. |
申请公布号 |
US2016071686(A1) |
申请公布日期 |
2016.03.10 |
申请号 |
US201414482761 |
申请日期 |
2014.09.10 |
申请人 |
Varian Semiconductor Equipment Associates, Inc. |
发明人 |
Hermanson Eric D.;Mitchell Robert J.;Anella Steven;Blahnik Jeffrey Charles;Weaver William T.;Rohrer Michael;Buonodono James P. |
分类号 |
H01J37/18;H01J37/20;H01J37/317 |
主分类号 |
H01J37/18 |
代理机构 |
|
代理人 |
|
主权项 |
1. An ion implantation apparatus comprising:
an enclosure defining a process chamber; a carriage slidably mounted on a shaft within the process chamber and coupled to a drive mechanism adapted to selectively move the carriage along the shaft; a platen assembly coupled to the carriage; and a linkage conduit extending between a side wall of the enclosure and the carriage, the linkage conduit comprising a plurality of pivotably interconnected linkage members that define a contiguous internal volume, the linkage conduit coupled to a vacuum source that maintains vacuum pressure within the internal volume. |
地址 |
Gloucester MA US |