发明名称 LINKAGE CONDUIT FOR VACUUM CHAMBER APPLICATIONS
摘要 An ion implantation apparatus including an enclosure defining a process chamber, a carriage slidably mounted on a shaft within the process chamber and coupled to a drive mechanism adapted to selectively move the carriage along the shaft. A platen assembly can be coupled to the carriage, and a linkage conduit can extend between a side wall of the enclosure and the carriage. The linkage conduit can include a plurality of pivotably interconnected linkage members that define a contiguous internal volume that is sealed from the process chamber. The contiguous volume can be held at a desired vacuum pressure separate from the vacuum environment of the process chamber.
申请公布号 US2016071686(A1) 申请公布日期 2016.03.10
申请号 US201414482761 申请日期 2014.09.10
申请人 Varian Semiconductor Equipment Associates, Inc. 发明人 Hermanson Eric D.;Mitchell Robert J.;Anella Steven;Blahnik Jeffrey Charles;Weaver William T.;Rohrer Michael;Buonodono James P.
分类号 H01J37/18;H01J37/20;H01J37/317 主分类号 H01J37/18
代理机构 代理人
主权项 1. An ion implantation apparatus comprising: an enclosure defining a process chamber; a carriage slidably mounted on a shaft within the process chamber and coupled to a drive mechanism adapted to selectively move the carriage along the shaft; a platen assembly coupled to the carriage; and a linkage conduit extending between a side wall of the enclosure and the carriage, the linkage conduit comprising a plurality of pivotably interconnected linkage members that define a contiguous internal volume, the linkage conduit coupled to a vacuum source that maintains vacuum pressure within the internal volume.
地址 Gloucester MA US