| 发明名称 |
RECYCLE PHOTOCHEMICAL TO REDUCE COST OF MATERIAL AND ENVIRONMENTAL IMPACT |
| 摘要 |
This invention discloses an apparatus for coating a semiconductor wafer in a coating chamber comprising a platform for placing the semiconductor wafer thereon. The apparatus further includes a catch and recycle (C&R) apparatus comprises a rim/ring controllable to move below and surround the platform for receiving and catching a coating material spurned off in coating the semiconductor wafer. |
| 申请公布号 |
US2016067729(A1) |
申请公布日期 |
2016.03.10 |
| 申请号 |
US201414480080 |
申请日期 |
2014.09.08 |
| 申请人 |
Wu Winston;Gu Yiming |
发明人 |
Wu Winston;Gu Yiming |
| 分类号 |
B05B15/04;H01L21/027;H01L21/02 |
主分类号 |
B05B15/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus for coating a semiconductor wafer in a coating chamber comprising a platform for placing the semiconductor wafer thereon, further comprising:
a catch and recycle (C&R) apparatus comprises a rim/ring controllable to move below and surround the platform for receiving and catching a coating material spun off from the semiconductor wafer in a coating process of the semiconductor wafer. |
| 地址 |
Hillsboro OR US |
