发明名称 METHOD FOR MEASURING LEAKAGE CURRENT OF THIN FILM TRANSISTOR
摘要 The objective of the present invention is to provide a method for measuring a leakage current of a thin film transistor capable of accurately measuring a low leakage current. To achieve the objective, the method comprises: a step of connecting one end of a capacitor to a source electrode of the thin film transistor under an environment where a preset temperature is maintained, and of grounding the other end of the capacitor; a step of applying a drain voltage to a drain electrode of the thin film transistor and applying a gate voltage to a gate electrode of the thin film transistor; and a step of measuring the source voltage of the source electrode which changes over time in the gate voltage.
申请公布号 KR20160027428(A) 申请公布日期 2016.03.10
申请号 KR20140114183 申请日期 2014.08.29
申请人 LG DISPLAY CO., LTD. 发明人 SHIN, MIN HO;KANG, JONG SEUK;LEE, KYUNG HO;BANG, HYUNG JIN;KIM, KI WOO;CHOI, YOON JI;PARK, CHOONG KOO
分类号 G01R31/26;G01R31/02 主分类号 G01R31/26
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