发明名称 LIQUID IMMERSION MEMBER AND EXPOSURE APPARATUS
摘要 A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate by exposure light via a first liquid between an emitting surface of an optical member and the substrate, and is capable of forming a liquid immersion space on an object movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member; a second member that is capable of being opposite to the object and is movable outside an optical path of the exposure light; and a protection part that protects the optical member. The protection part decreases a change in pressure which the optical member receives from the liquid in the liquid immersion space.
申请公布号 US2016070177(A1) 申请公布日期 2016.03.10
申请号 US201514743265 申请日期 2015.06.18
申请人 NIKON CORPORATION 发明人 SATO Shinji;ODANAKA Kenyo
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址 Tokyo JP
您可能感兴趣的专利