发明名称 グラフェンの作製方法
摘要 PROBLEM TO BE SOLVED: To provide excellent inherent characteristics of graphene, in a structure in which graphene is formed on a surface where an SiC surface is terminated with hydrogen atoms.SOLUTION: A carbon buffer layer with a 6√3×6√3 structure is formed on a surface of an SiC substrate by heating the SiC substrate in a step S101 (the first step). Next in a step S102, hydrogen is supplied to the surface of the SiC substrate with the carbon buffer layer formed thereon in a state in which the SiC substrate is heated, graphene is formed by cutting the bond between the carbon buffer layer and Si on the substrate side, and a dangling bond of Si existing between graphene and the SiC substrate is terminated by hydrogen (the second step). After forming graphene in this way, in a step S103, a hydrocarbon existing on the substrate side of graphene is removed by heating the SiC substrate with graphene formed thereon in a vacuum (the third step).
申请公布号 JP5882928(B2) 申请公布日期 2016.03.09
申请号 JP20130035493 申请日期 2013.02.26
申请人 日本電信電話株式会社 发明人 前田 文彦;田邉 真一;日比野 浩樹
分类号 C01B31/02 主分类号 C01B31/02
代理机构 代理人
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