发明名称 PLASMA GENERATION REACTING DEVICE
摘要 <p>PURPOSE:To expand a plasma area formed in a resonator and to uniformly form a thin film on the surface of a substrate over a wide range by using a cavity resonator which has plural radio wave input ports by connected electrically to a radio wave system as an applicator. CONSTITUTION:A microwave oscillated by a single microwave oscillator 31 is passed through an isolator 32 and divided by a T-shaped branch pipe 33 into two, which are supplied to microwave input ports 34a and 34b of the applicator 34. Then a cylindrical resonator, for example, is used as the applicator 34. The resonator 60 forms the cavity resonator which has the microwave input ports 34a and 34b facing a cylindrical conductor 61 axially, quartz plates 63a and 63b as partition plates for holding a vacuum, a holding base 64 for the substrate 48, etc. Then the resonator 60 resonates in TE113 mode to form the plasma area covering the surface of the substrate 48. Thus, the cylindrical resonator 60 is used as the applicator to form a uniform film, crystal, etc., on the surface of the substrate 48 over a wide range, and plasma polymerization, plasma processing, etc., which are not affected by the attribute of a sample are performed.</p>
申请公布号 JPS6411403(A) 申请公布日期 1989.01.17
申请号 JP19870166677 申请日期 1987.07.03
申请人 NEW JAPAN RADIO CO LTD 发明人 TAKAMURA FUMIO;OTAKE KOHEI
分类号 H01P7/06;H05H1/46 主分类号 H01P7/06
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