| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an evaluation method of a DAC amplifier capable of predicting abnormalities (failure) of a DAC amplifier in advance, by detecting change of shot reliably before the DAC amplifier is detected as abnormal (failed) while maintaining the throughput, and to provide a charged particle beam lithography apparatus. <P>SOLUTION: The evaluation method of a DAC amplifier includes the steps for: receiving and adding analog voltage signals output from DAC amplifiers 34, 35; converting an addition signal produced as a result of addition into a digital addition signal; and detecting an error based on the digital addition signal. In the error detection step, the settling latency of electron beam irradiation is set shorter than a setting time, and the fact that the voltage values of the DAC amplifiers 34, 35 deviate from a preset threshold during shot of a charged particle beam is defined as an error. <P>COPYRIGHT: (C)2013,JPO&INPIT |
