| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming apparatus which can suppress release of deposits from deposition preventing means.SOLUTION: A film forming apparatus for forming a film on an object to be film-formed comprises a frame 71 arranged between film forming means and holding means of the object to be film-formed, deposition preventing plates 73 extending from both ends of the frame 71 to corresponding both sides of the film forming means, and cooling piping 72 installed to at least one end of the frame 71. An opening part 71a through which film-forming particles moving from the film forming means to the holding means pass, is provided between both ends of the frame 71. Each deposition preventing plate 73 is detachably supported by the frame 71 with a distance from the frame 71. A baffle plate 74 is provided at a position which shields a part of the cooling piping 72, facing a space between the film forming means and the holding means, from the space, and which is away from the cooling piping 72 and the deposition preventing plate 73. |
