发明名称 CMOS-compatible polycide fuse structure and method of fabricating same
摘要 CMOS-compatible polycide fuse structures and methods of fabricating CMOS-compatible polycide fuse structures are described. In an example, a semiconductor structure includes a substrate. A polycide fuse structure is disposed above the substrate and includes silicon and a metal. A metal oxide semiconductor (MOS) transistor structure is disposed above the substrate and includes a metal gate electrode.
申请公布号 GB2529955(A) 申请公布日期 2016.03.09
申请号 GB20150020616 申请日期 2013.06.25
申请人 INTEL CORPORATION 发明人 JENG-YA D YEH;CHIA-HONG JAN;WALID M HAFEZ;JOODONG PARK
分类号 H01L21/8234;H01L21/336;H01L23/525;H01L27/088;H01L29/78 主分类号 H01L21/8234
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