| 发明名称 |
RESIST COMPOSITION AND PATTERNING PROCESS |
| 摘要 |
A resist composition comprising a polymer comprising recurring units of lactone and a PAG is provided. The resist composition has a high dissolution contrast during organic solvent development, and improved resist properties including MEF and CDU and forms a fine hole pattern with improved roundness and size control. |
| 申请公布号 |
EP2993520(A1) |
申请公布日期 |
2016.03.09 |
| 申请号 |
EP20150182686 |
申请日期 |
2015.08.27 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
FUJIWARA, TAKAYUKI;SAGEHASHI, MASAYOSHI;HASEGAWA, KOJI;OIKAWA, KENICHI |
| 分类号 |
G03F7/004;G03F7/039;G03F7/32 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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| 地址 |
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