发明名称 Integrated circuit through-substrate via system with a buffer layer and method of manufacture thereof
摘要 An integrated circuit substrate via system, and method of manufacture therefor, includes: a substrate having a substrate via in the substrate; a buffer layer patterned over the substrate via, the buffer layer having a planar surface; and a substrate via cap patterned over the buffer layer, the substrate via cap having a planar surface based on the planar surface of the buffer layer.
申请公布号 US9281274(B1) 申请公布日期 2016.03.08
申请号 US201314040413 申请日期 2013.09.27
申请人 STATS ChipPAC Ltd. 发明人 Zhao Xing;Yong Chang Bum;Na Duk Ju;Aung Kyaw Oo;Ji Ling
分类号 H01L23/48;H01L23/52;H01L29/40;H01L23/532;H01L21/768 主分类号 H01L23/48
代理机构 Ishimaru & Associates LLP 代理人 Ishimaru & Associates LLP
主权项 1. A method of manufacturing an integrated circuit substrate via system comprising: providing a substrate having a substrate via in the substrate, the substrate via has a top surface and a bottom surface exposed from the substrate; patterning a photoresist layer over the substrate; patterning a buffer layer over the substrate via in the photoresist layer, the buffer layer has a planar surface; patterning a substrate via cap over the buffer layer in the photoresist layer, the substrate via cap has a planar surface based on the planar surface of the buffer layer; removing the photoresist layer; and patterning the substrate via cap and patterning the buffer layer include reducing a thickness of an adhesive layer of the substrate via cap to increase conductivity of the substrate via cap to compensate for increased resistivity of the buffer layer.
地址 Singapore SG