Machine for plasma treatment of containers comprising an integrated vacuum circuit

摘要

A machine for plasma treatment of containers, including a chamber for receiving a container to be treated, the chamber connected to a primary vacuum circuit. A pressure sensor is connected to the chamber. There is a first mechanism for communicating the pressure sensor with the chamber; a secondary vacuum circuit dependent on the first circuit and connected to the pressure sensor; and second mechanism for communicating the pressure sensor with the secondary vacuum circuit.

主权项

1. Machine for plasma treatment of containers, said machine comprising:
a chamber for receiving a container to be treated, said chamber being connected to a primary vacuum circuit, a pressure sensor connected to the chamber, first means for communicating the pressure sensor with the chamber, a secondary vacuum circuit, independent of the primary circuit and connected to the pressure sensor, wherein the secondary vacuum comprises an integrated secondary source of suction, separate from a primary source of suction of the primary circuit, and second means for communicating the pressure sensor with the secondary vacuum circuit, wherein the pressure sensor is a differential sensor, of which a first compartment is connected to the chamber, a second compartment to the secondary vacuum circuit, and means for communicating the two compartments of the sensor.