发明名称 Process for producing liquid ejection head
摘要 The present invention provides a process for producing a liquid ejection head, the process including: (1) forming a mold pattern of a liquid flow path and a base pattern surrounding the mold pattern on a substrate, (2) disposing a covering layer to cover the mold pattern and the base pattern, (3) forming at least an ejection orifice in the covering layer to form an orifice plate, and (4) removing the mold pattern and the base pattern, in which the base pattern has such a form that the orifice plate is formed to have a side wall portion constituting a side wall of the liquid flow path and a plurality of support structures that are disposed on the substrate in a peripheral region of the side wall portion and support an upper surface portion constituting an upper wall of the orifice plate.
申请公布号 US9278532(B2) 申请公布日期 2016.03.08
申请号 US201213654763 申请日期 2012.10.18
申请人 Canon Kabushiki Kaisha 发明人 Asai Kazuhiro;Honda Tetsuro
分类号 B41J2/16;B41J2/14 主分类号 B41J2/16
代理机构 Fitzpatrick, Cella, Harper & Scinto 代理人 Fitzpatrick, Cella, Harper & Scinto
主权项 1. A process for producing a liquid ejection head including an orifice plate having an ejection orifice for ejecting a liquid and a liquid flow path in communication with the ejection orifice, and a substrate having an ejection energy generating element for generating energy for ejecting the liquid, the process comprising: (1) forming a mold pattern of the liquid flow path and a base pattern surrounding the mold pattern on the substrate; (2) disposing a covering layer to cover the mold pattern and the base pattern; (3) forming at least the ejection orifice in the covering layer to form the orifice plate; and (4) removing the mold pattern and the base pattern, wherein the base pattern is formed in such a form that the orifice plate includes a side wall portion constituting a side wall of the liquid flow path and a plurality of support structures that are disposed on the substrate in a peripheral region of the side wall portion and support an upper surface portion constituting an upper wall of the orifice plate, and wherein the base pattern has a mesh form.
地址 Tokyo JP