| 摘要 |
<P>PROBLEM TO BE SOLVED: To simplify a process of forming a transmissive colored layer and a reflective colored layer using a direct exposure system. <P>SOLUTION: A colored photoresist layer is formed on a substrate; the colored photoresist layer is exposed by irradiating a predetermined exposure region with laser light from above the colored photoresist layer; an unexposed part is removed by development; and a transmissive colored layer and a reflective colored layer comprising the colored photoresist are formed by heating and calcining the colored photoresist layer after the development is finished. In the above process, the exposure region corresponding to the transmissive colored layer and the reflective colored layer is segmented, and the segments of the exposure region are individually selectively irradiated with laser light to obtain predetermined film thickness in the transmissive colored layer and in the reflective colored layer after heated. <P>COPYRIGHT: (C)2013,JPO&INPIT |
