发明名称 感光性樹脂組成物、これを用いたフォトレジストフィルム、レジストパターンの形成方法及び導体パターンの形成方法
摘要 The present invention relates to a photosensitive resin composition comprising a binder polymer, a photopolymerizable monomer containing an amine group, a photopolymerization initiator, and a benzotriazole derivative containing a carboxyl group. The present invention also relates to a photoresist film containing a photosensitive resin composition layer comprising the photosensitive resin composition and a support layer. The photosensitive resin composition and photoresist film provide excellent resolution and adhesion, an extremely small fringe on the cured resist after development, and excellent release properties.
申请公布号 JP5878040(B2) 申请公布日期 2016.03.08
申请号 JP20120042872 申请日期 2012.02.29
申请人 ニッコー・マテリアルズ株式会社 发明人 豊田 大貴
分类号 G03F7/027;G03F7/004;H05K3/06;H05K3/18 主分类号 G03F7/027
代理机构 代理人
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