| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which has excellent solubility in an alkali aqueous solution and imparts a cured film having small variation in residual stress and excellent chemical resistance. <P>SOLUTION: A photosensitive resin composition includes (a) a resin having a phenolic hydroxyl group, (b) a compound reactive to the phenolic hydroxyl group of the resin (a), (c) a photosensitive compound, and (d) a crosslinking agent. The hydrogen of the phenolic hydroxyl group of the resin having a phenolic hydroxyl group can be substituted with another group at a modification ratio of hydroxyl group within a specified range. <P>COPYRIGHT: (C)2013,JPO&INPIT |
