| 主权项 |
1. An exposure apparatus having an illumination optical system that irradiates light from a light source onto a mask, a mask stage that holds the mask, a projection optical system that projects a pattern of the mask onto a substrate, and a substrate stage that holds the substrate, to project the pattern of the mask onto the substrate while relatively moving the mask stage and the substrate stage along a first direction that is perpendicular to a projection direction in which the pattern of the mask is projected onto the substrate, the exposure apparatus further comprising:
an upper pedestal that supports the mask stage; and first and second intermediate pedestals that support the upper pedestal, wherein: the projection optical system (i) includes a plurality of projection optical modules that are arranged at different positions in a second direction perpendicular to the first direction and perpendicular to the projection direction, (ii) transmits light, which has passed through different portions of the mask, to respective ones of the plurality of projection optical modules, and (iii) projects the pattern of the mask onto the substrate, the first intermediate pedestal is arranged at a first side, in the second direction, of the plurality of projection optical modules, and the second intermediate pedestal is arranged at a second side opposite to the first side, in the second direction, of the plurality of projection optical modules. |
