发明名称 Operating process for an irradiation device
摘要 Known operating processes for an irradiation device for irradiating a substrate by a UV emitter include the process steps of: (a) operating the UV emitter at a nominal operating radiation power; (b) continuously feeding the substrate at a feed rate into the irradiation field; and (c) irradiating the substrate in the irradiation field defined by the UV emitter. In order to devise, on this basis, a simple and inexpensive operating process for an irradiation device, which makes a short start-up time feasible after an interruption of the production process, the UV emitter is switched off when there is an interruption of the continuous substrate feed. The emitter temperature of the switched-off UV emitter is measured, and provisions are made for counter-measures to counteract a decrease of the emitter temperature by more than 10° C. below the nominal operating temperature.
申请公布号 US9281093(B2) 申请公布日期 2016.03.08
申请号 US201514621624 申请日期 2015.02.13
申请人 Heraeus Noblelight GmbH 发明人 Lott Josef Zoltan;Brieden Karl-Wilhelm;Schloemp Silke
分类号 G21K5/10;H01L21/263;H01L21/324;B41F23/04 主分类号 G21K5/10
代理机构 Panitch Schwarze Belisario & Nadel LLP 代理人 Panitch Schwarze Belisario & Nadel LLP
主权项 1. An operating process for an irradiation device for irradiating a substrate by a UV emitter, the process comprising steps of: (a) operating the UV emitter at a nominal operating radiation power that is a function of a nominal operating temperature; (b) continuously feeding the substrate, at a feed rate, into an irradiation field defined by the UV emitter; and (c) irradiating the substrate in the irradiation field,wherein the UV emitter is switched off if there is an interruption of the continuous substrate feed, wherein an emitter temperature of the switched-off UV emitter is measured, and wherein counter-measures are provided to counteract a decrease of the emitter temperature by more than 10° C. below the nominal operating temperature.
地址 Hanau DE