发明名称 |
Color filter substrate and method for producing same |
摘要 |
Provided are: a color filter substrate that can improve the uniformity of thickness of color filters, and a method of manufacturing the color filter substrate. The method of manufacturing a color filter substrate includes: forming a plurality of photoresist films in layers on a transparent substrate; exposing said plurality of photoresist films via a photomask; forming a pattern having an opening by developing the plurality of photoresist films after exposure; and discharging ink into the opening. The photosensitivities of the plurality of photoresist films differ from each other. |
申请公布号 |
US9279924(B2) |
申请公布日期 |
2016.03.08 |
申请号 |
US201314421251 |
申请日期 |
2013.08.14 |
申请人 |
SHARP KABUSHIKI KAISHA |
发明人 |
Kawanishi Takafumi |
分类号 |
G02B5/20;G02B5/22;G02F1/1335;G03F7/16;G03F7/30;G03F7/00;G03F7/095 |
主分类号 |
G02B5/20 |
代理机构 |
Chen Yoshimura LLP |
代理人 |
Chen Yoshimura LLP |
主权项 |
1. A method of manufacturing a color filter substrate, said method comprising:
(a) layering a plurality of photoresist films on a transparent substrate; (b) exposing said plurality of photoresist films via a photomask; (c) forming partition walls having an opening defined therebetween by developing said plurality of photoresist films after exposure; and (d) discharging ink into said openings, wherein photosensitivities of the plurality of photoresist films differ from one another. |
地址 |
Osaka JP |