发明名称 Color filter substrate and method for producing same
摘要 Provided are: a color filter substrate that can improve the uniformity of thickness of color filters, and a method of manufacturing the color filter substrate. The method of manufacturing a color filter substrate includes: forming a plurality of photoresist films in layers on a transparent substrate; exposing said plurality of photoresist films via a photomask; forming a pattern having an opening by developing the plurality of photoresist films after exposure; and discharging ink into the opening. The photosensitivities of the plurality of photoresist films differ from each other.
申请公布号 US9279924(B2) 申请公布日期 2016.03.08
申请号 US201314421251 申请日期 2013.08.14
申请人 SHARP KABUSHIKI KAISHA 发明人 Kawanishi Takafumi
分类号 G02B5/20;G02B5/22;G02F1/1335;G03F7/16;G03F7/30;G03F7/00;G03F7/095 主分类号 G02B5/20
代理机构 Chen Yoshimura LLP 代理人 Chen Yoshimura LLP
主权项 1. A method of manufacturing a color filter substrate, said method comprising: (a) layering a plurality of photoresist films on a transparent substrate; (b) exposing said plurality of photoresist films via a photomask; (c) forming partition walls having an opening defined therebetween by developing said plurality of photoresist films after exposure; and (d) discharging ink into said openings, wherein photosensitivities of the plurality of photoresist films differ from one another.
地址 Osaka JP