Imprint lithography method and apparatus

摘要

In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.

主权项

1. An imprint lithography apparatus, comprising:
an imprintable medium dispenser; a control system, the control system configured to control the imprintable medium dispenser in order to:
provide a first amount of imprintable medium for nanoimprint lithography on a first area of a substrate onto which a pattern is to be imprinted, the first amount of imprintable medium, when fixed, having a first etch rate as a physical characteristic thereof, andprovide a second amount of imprintable medium for nanoimprint lithography on a second area of the substrate different from the first area of the substrate, the second amount of imprintable medium, when fixed, having a second etch rate as a physical characteristic thereof, wherein the second etch rate is different from the first etch rate; and the control system configured to control imprinting at least part of an imprint template into both the first amount of imprintable medium and the second amount of imprintable medium when both the first and second amounts are on the substrate substantially at a same time.