发明名称 SiC単結晶の製造方法
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing an SiC single crystal that can improve the quality of the single crystal.SOLUTION: A method of manufacturing an SiC single crystal includes: a preparation step; a generation step; and a growth step. In the preparation step, a manufacturing apparatus is prepared which includes a crucible containing a raw material of an Si-C solution and a high-frequency coil arranged at a periphery of a side wall of the crucible. In the generation step, the raw material in the crucible is heated by the high-frequency coil to be fused so as to generate the Si-C solution. In the growth step, an SiC seed crystal is brought into contact with the Si-C solution so as to grow an SiC single crystal on the SiC seed crystal. The growth step includes a maintenance step. In the maintenance step, at least one of the crucible and high-frequency coil is moved in a height direction relatively to the other to maintain a width of variation in height-directional separation distance between a liquid level of the Si-C solution and the height center of the high-frequency coil within a predetermined range.
申请公布号 JP5877812(B2) 申请公布日期 2016.03.08
申请号 JP20130081376 申请日期 2013.04.09
申请人 新日鐵住金株式会社;トヨタ自動車株式会社 发明人 楠 一彦;亀井 一人;大黒 寛典;加渡 幹尚;坂元 秀光
分类号 C30B29/36;C30B19/10;H01L21/208 主分类号 C30B29/36
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