| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition which makes good the flatness of the surface of a glass substrate after treatment and achieves a high treatment speed in removing a mask blank, e.g. a molybdenum silicide film, a molybdenum silicide oxide film or a molybdenum silicide nitride film formed on the glass substrate and a removal method using the composition.SOLUTION: A composition is an aqueous solution containing (A) 0.01-50 mass% of a hydrogen peroxide ingredient, (B) 0.01-1 mass% of an ammonium fluoride ingredient and (C) at least one acid ingredient selected from phosphoric, sulfuric and nitric acids, and the pH of the aqueous solution is 1-3.SELECTED DRAWING: None |
