| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure method and an exposure apparatus, by which positional deviation between an exposure pattern on a first surface side and an exposure pattern on a second surface side of an exposure object can be decreased.SOLUTION: The exposure method includes an irradiation step, in which while scanning and irradiating a top surface 201 of an exposure object substrate 200 having the top surface 201 and a back surface 202 opposing to each other with laser light LL1 as well as scanning and irradiating the back surface 202 with laser light LL2, the exposure object substrate 200 is moved in a direction intersecting the scanning direction of the laser light LL1 and the scanning direction of the laser light LL2. An exposure pattern on the top surface 201 side transferred by the irradiation with the laser light LL1 is different from an exposure pattern on the back surface 203 side transferred by the irradiation with the laser light LL2.SELECTED DRAWING: Figure 1 |
