| 摘要 |
The present invention relates to a compound, a resin, a resist composition, and a method for producing a resist pattern. The resist composition of the present invention comprises: a resin (a1) including a structure unit having an acid labile group; a resin (a2) including a structure unit having a group represented by chemical formula (ia); and an acid generating agent. In the chemical formula, r1 represents a fluorine atom or a fluorinated alkyl group having 1-6 carbon atoms respectively, and cyclic w represents a substitutive hydrocarbon group having 5-18 carbon atoms. In addition, n refers to an integer of 1-6, and * refers to a binding site. According to the present invention, it is possible to obtain a defectless resist pattern with favorable line edge roughness (LER). |
