发明名称 PROCESS LIQUID FOR SILICEOUS FILM FORMATION
摘要 PROBLEM TO BE SOLVED: To provide a novel process liquid and processing method that can impart excellent rust-prevention performance and excellent lubricity to a wide range of metal materials.SOLUTION: The present invention provides a process liquid for siliceous film formation that comprises solution comprising alkoxysilane oligomer, colloidal silica and lubricant, and a siliceous film forming method characterized in that the process liquid is applied on a processed object before hardening it.SELECTED DRAWING: None
申请公布号 JP2016030777(A) 申请公布日期 2016.03.07
申请号 JP20140152941 申请日期 2014.07.28
申请人 OKUNO CHEM IND CO LTD 发明人 SHIMAHASHI KATSUMASA;KATO TAKASHI;MURAHASHI KOICHIRO;OTSUKA KUNIAKI
分类号 C09D183/04;B05D7/24;C09D1/00;C09D5/00;C09D7/12;C10M103/00;C10M105/76;C10M125/26;C10M139/04;C10M155/02;C10M159/06;C23C22/53 主分类号 C09D183/04
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