发明名称 |
PROCESS LIQUID FOR SILICEOUS FILM FORMATION |
摘要 |
PROBLEM TO BE SOLVED: To provide a novel process liquid and processing method that can impart excellent rust-prevention performance and excellent lubricity to a wide range of metal materials.SOLUTION: The present invention provides a process liquid for siliceous film formation that comprises solution comprising alkoxysilane oligomer, colloidal silica and lubricant, and a siliceous film forming method characterized in that the process liquid is applied on a processed object before hardening it.SELECTED DRAWING: None |
申请公布号 |
JP2016030777(A) |
申请公布日期 |
2016.03.07 |
申请号 |
JP20140152941 |
申请日期 |
2014.07.28 |
申请人 |
OKUNO CHEM IND CO LTD |
发明人 |
SHIMAHASHI KATSUMASA;KATO TAKASHI;MURAHASHI KOICHIRO;OTSUKA KUNIAKI |
分类号 |
C09D183/04;B05D7/24;C09D1/00;C09D5/00;C09D7/12;C10M103/00;C10M105/76;C10M125/26;C10M139/04;C10M155/02;C10M159/06;C23C22/53 |
主分类号 |
C09D183/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|