发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device, and a semiconductor device, capable of preventing peel-off of an insulation part formed on a lateral face of a semiconductor substrate, and generation of air bubbles in the insulation part.SOLUTION: A method of manufacturing a semiconductor device includes: a step of putting in a first molding mold a semiconductor substrate on whose first principal surface a first electrode is formed, on whose second principal surface at an opposite side to the first principal surface a second electrode is formed, and whose lateral face is coated by resin, to form a first insulation part contacted with the resin coating; and a step of putting in a second molding mold the semiconductor substrate on which the first insulation part is formed to form a second insulation part that covers the first insulation part.SELECTED DRAWING: Figure 1
申请公布号 JP2016032071(A) 申请公布日期 2016.03.07
申请号 JP20140155041 申请日期 2014.07.30
申请人 MITSUBISHI ELECTRIC CORP 发明人 NAKAJIMA NOBUHISA;SAKAMOTO TOKUMITSU
分类号 H01L21/56;H01L23/29;H01L23/31;H01L23/48;H01L25/07;H01L25/18;H01L29/06;H01L29/74 主分类号 H01L21/56
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