发明名称 FILM FORMING METHOD, FILM, AND DISPERSION
摘要 PROBLEM TO BE SOLVED: To provide a film forming method, a film, and a dispersion.SOLUTION: The film forming method includes a step in which a dispersion that contains a compound comprising a Broensted acid and a Broensted base, and a structure having a graphene structure is used and the compound is volatilized. It is preferable that the boiling point of the compound comprising a Broensted acid and a Broensted base is lower than the decomposition point of the compound. The compound comprising a Broensted base and a Broensted base is preferably a compound having a carboxylic acid.SELECTED DRAWING: None
申请公布号 JP2016030713(A) 申请公布日期 2016.03.07
申请号 JP20140153936 申请日期 2014.07.29
申请人 SUMITOMO CHEMICAL CO LTD 发明人 KOBAYASHI NORIFUMI;HIGASHIMURA HIDEYUKI
分类号 C01B31/02 主分类号 C01B31/02
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