发明名称 |
SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM |
摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target for a magnetic recording medium that enables a recording film which has a lower Pt content and higher density than before and also has high Ku and a high order parameter to be manufactured.SOLUTION: A sputtering target for a magnetic recording medium according to the present invention is a sintered body which contains one or both of at least Ir and Pd in a magnetic alloy containing Fe and Pt as metal dissolved in the magnetic alloy, and further contains carbon and one or both of metal oxide or silicon oxide as oxide. The magnetic alloy has a composition such that Pt is contained by 35-45 at.%, one or both of Ir and Pd is contained by 4-10 at.% in total, and Fe and inevitable impurities are contained for the rest, relative density of the sintered body being 90% or higher.SELECTED DRAWING: None |
申请公布号 |
JP2016030857(A) |
申请公布日期 |
2016.03.07 |
申请号 |
JP20140154252 |
申请日期 |
2014.07.29 |
申请人 |
FURUYA KINZOKU:KK;TOHOKU UNIV |
发明人 |
KUBOKI YOSHIYUKI;MARUKO TOSHIHIRO;SUZUKI TAKESHI;SAITO SHIN;HYUGA SHINTARO;TAKAHASHI KEN |
分类号 |
C23C14/34;C22C1/05;C22C5/04;G11B5/65;G11B5/851 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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