发明名称 |
METHOD FOR MANUFACTURING WIRING BOARD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR PACKAGE |
摘要 |
PROBLEM TO BE SOLVED: To provide a wiring board capable of achieving a package with excellent durability in a high yield.SOLUTION: An opening 28 forming step forms an opening 28 through which a part of a conductor pattern 24 is exposed to a prescribed region of an insulating resin film 10. A desmear treatment step subjects a surface of an insulating resin film 10 and the opening 28 to desmear treatment. A plating film 246 forming step forms a plating film 246 in the opening 28. A plasma treatment step subjects the insulating resin film 10 and a surface of the plating film 246 to plasma treatment. The opening 28 forming step also includes a step of irradiating a region serving as the opening 28 with a laser beam in the insulating resin film 10. The plasma treatment step performs plasma treatment without etching the insulating resin film 10.SELECTED DRAWING: Figure 2 |
申请公布号 |
JP2016031987(A) |
申请公布日期 |
2016.03.07 |
申请号 |
JP20140153052 |
申请日期 |
2014.07.28 |
申请人 |
SUMITOMO BAKELITE CO LTD |
发明人 |
TACHIBANA KENYA |
分类号 |
H05K3/26;H01L23/12;H05K3/24;H05K3/28 |
主分类号 |
H05K3/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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