发明名称 METHOD FOR MANUFACTURING WIRING BOARD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR PACKAGE
摘要 PROBLEM TO BE SOLVED: To provide a wiring board capable of achieving a package with excellent durability in a high yield.SOLUTION: An opening 28 forming step forms an opening 28 through which a part of a conductor pattern 24 is exposed to a prescribed region of an insulating resin film 10. A desmear treatment step subjects a surface of an insulating resin film 10 and the opening 28 to desmear treatment. A plating film 246 forming step forms a plating film 246 in the opening 28. A plasma treatment step subjects the insulating resin film 10 and a surface of the plating film 246 to plasma treatment. The opening 28 forming step also includes a step of irradiating a region serving as the opening 28 with a laser beam in the insulating resin film 10. The plasma treatment step performs plasma treatment without etching the insulating resin film 10.SELECTED DRAWING: Figure 2
申请公布号 JP2016031987(A) 申请公布日期 2016.03.07
申请号 JP20140153052 申请日期 2014.07.28
申请人 SUMITOMO BAKELITE CO LTD 发明人 TACHIBANA KENYA
分类号 H05K3/26;H01L23/12;H05K3/24;H05K3/28 主分类号 H05K3/26
代理机构 代理人
主权项
地址